Method for controlling substrate temperature in a high temperatu

Details Method for controlling substrate temperature in a high temperatu Method for controlling substrate temperature in a high temperatu

1988-06-23

1989-03-07

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041921, 20419213, 20419215, 204298, C23C 1416, C23C 1454

Patent

active

048103420

ABSTRACT:
This high temperature heating sputtering process comprises the steps of:

REFERENCES:
patent: 4565601 (1986-01-01), Kakehi et al.
P. S. McLeod et al., Journal Vac. Sci. Tech., vol. 14, No. 1, pp. 263-265, Jan./Feb. 1977.

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