Method of photochemical surface treatment

Details Method of photochemical surface treatment Method of photochemical surface treatment

1985-11-20

1987-07-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 156654, 156345, 427 38, 427 55, H01L 21306, B05D 306, B44C 122, C03C 1500

Patent

active

046785361

ABSTRACT:
A method of photochemically treating a surface of a material is disclosed which includes a step of introducing a reaction gas into a reaction chamber having a substrate therein, to make the reaction gas be adsorbed on the surface of the substrate, and a step of exposing the substrate to radiation of a wavelength at which the absorption of radiation energy by the reaction gas existing in the inner space of the reaction chamber is negligibly small and the radiation energy is absorbed by the reaction gas adsorbed on the surface of the substrate, wherein the kind of the reaction gas and the wavelength of the radiation are selected so that the surface of a predetermined material forming a pattern on the substrate can be selectively treated.

REFERENCES:
patent: 2841477 (1958-07-01), Hall
patent: 3364087 (1968-01-01), Solomon et al.
patent: 4478677 (1984-10-01), Chen et al.
patent: 4566937 (1986-01-01), Pitts
O. Butsuri, Applied Physics, No. 6, vol. 53, Jan. 23, 1984, pp. 516-520.
Glass et al., "Interaction of Metal Particles with Adsorbed Dye Molecules: Absorption and Luminescence", Optics Letters, vol. 5, No. 9, Sep. 1980, pp. 368-370.
Abstract of the Binary Meeting of the Japan Society of Applied Physics, p. 344.
WO-A-8 304 269 (Mass. Inst. of Technology), claim 1, p. 3, last paragraph, p. 4, first paragraph.
Patent Abstracts of Japan, vol. 7, No. 200 (E-196) [1345], Sep. 3, 1983; & JP-A-58-98929 (Suwa Seikosha) 06-13-1983 .
Thin Solid Films, vol. 92, Nos. 1/2, Jun. 1982, pp. 33-40, Lausanne, CH; Y. Kurogi: "Recent Trends in Dry Etching", Section 3, pp. 35-36.
Extended Abstracts of the 15th Conference on Solid State Devices and Materials, (supplement to the Japanese Journal of Applied Physics, 1983) pp. 109-115; P. K. Boyer et al: "Microelectronic Thin Film Deposition by UV Laser Photolysis".

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