Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-10-14
1989-03-28
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 427130, 427255, 427370, C23C 1434
Patent
active
048161284
ABSTRACT:
A process for producing a substrate member for magnetic recording disc with improved surface state free of defects such as micropores and strain due to machining, and improved surface roughness, such substrate being obtained by first forming a glass coating layer on the surface of a substrate of an alumina-based ceramic material containing therein micropores of 5 .mu.m or less and having a relative theoretical density of 90% or above; then, subjecting the glass coating layer on a substrate to the hot isostatic pressing treatment; and further subjecting the surface of the glass coating layer to mechanochemical polishing to a layer thickness in a range of from 3 .mu.m to 200 .mu.m and the surface free from micropores and strain. Glass coating may be done by glazing or vapor deposition like sputtering.
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Nakaoka Junichi
Ono Takayuki
Wada Toshiaki
Nguyen Nam X.
Sumitomo Special Metals Co. Ltd.
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