Method of eliminating undesirable carbon product deposited on th

Details Method of eliminating undesirable carbon product deposited on th Method of eliminating undesirable carbon product deposited on th

1988-02-24

1989-03-28

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118728, 118 501, 118623, 134 1, 156646, 156345, 427 38, 427 451, 427 47, 427122, 2041923, 20419235, 204298, B44C 122, C03C 1500, C03C 2506

Patent

active

048161136

ABSTRACT:
The inside of a reaction chamber for CVD is cleaned after deposition of a carbon film. When crystalline carbon or diamond-like carbon is formed in the chamber, undesirable deposition occurs on the inside of the reaction chamber. The sticky carbon deposition is removed by etching, making use of oxygen or oxygen compound gas rather than fluorine or chlorine compound gas which tends to damage the inside of the reaction chamber.

REFERENCES:
patent: 4138306 (1979-02-01), Niwa
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4576698 (1986-03-01), Gallagher
patent: 4620898 (1986-11-01), Banks

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