Liquid coating composition for use in forming photoresist coatin

Details Liquid coating composition for use in forming photoresist coatin Liquid coating composition for use in forming photoresist coatin

1997-02-12

1998-07-21

Schofer, Joseph L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03C 176

Patent

active

057833621

ABSTRACT:
A liquid coating composition for forming an anti-interference film over a photoresist film is prepared by combining a water-soluble, film-forming component with a specified fluorosurfactant or by combining said water-soluble, film-forming component with a fluorosurfactant and a specified anionic surfactant. A coating film is formed from said liquid coating composition over a photoresist film to produce a photoresist material of a dual structure. The photoresist material is particularly effective in lessening the multiple-interference effect of light, thereby enabling the formation of very fine resist patterns having high fidelity to mask patterns.

REFERENCES:
patent: 4293657 (1981-10-01), Nissen et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5514526 (1996-05-01), Nishi et al.

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