Method for servicing vacuum chamber using non-reactive gas-fille

Details Method for servicing vacuum chamber using non-reactive gas-fille Method for servicing vacuum chamber using non-reactive gas-fille

1992-12-11

1994-05-31

Bell, Mark L.

Coating processes

Coating by vapor, gas, or smoke

118DIG7, 454188, C23C 1600

Patent

active

053167945

ABSTRACT:
A process and apparatus is disclosed for providing access to the interior of a vacuum deposition chamber in a vacuum deposition apparatus without exposing residues, such as chlorosilane residues, within the chamber to moisture and/or oxygen-containing gases. The process comprises first placing over the upper surface of the vacuum deposition apparatus an enclosure which has a bottom opening large enough to completely cover the top opening to the chamber, and which is capable of being filled with one or more non-reactive gases. One or more non-reactive gases are then flowed into the enclosure to purge moisture and/or oxygen-containing gases from the enclosure. After the enclosure has been mounted on the apparatus and purged by the flow of non-reactive gases therein, the vacuum deposition chamber may be opened, while continuing the flow of non-reactive gases into the enclosure. After servicing, the vacuum deposition chamber may be resealed, the flow of non-reactive gases shut off, and the enclosure then removed from the apparatus. In a preferred embodiment, the flow of non-reactive gases into the enclosure is positioned to flow down from the top of the enclosure at a right angle to openings in the sidewall of the enclosure provided for accessing the vacuum deposition chamber, to thereby provide a gas curtain of non-reactive gas flow across the openings to inhibit ingress of moisture and/or oxygen-containing gases, as well as particulate impurities, into the enclosure.

REFERENCES:
patent: 4901764 (1990-02-01), Meline
patent: 5020475 (1991-06-01), Crabb et al.

Affiliated with

Also associated with

Rating

Method for servicing vacuum chamber using non-reactive gas-fille does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for servicing vacuum chamber using non-reactive gas-fille, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for servicing vacuum chamber using non-reactive gas-fille will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1626685