Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-11-09
1997-02-18
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 2041922, 428694DF, 428694NF, 428694AM, 428800, 428 643, 360 59, 360114, 360131, 360135, 365122, 369 13, G11B 566, C23C 1400
Patent
active
056038143
ABSTRACT:
A method of making a magneto-optical disk. A first AlGeN dielectric film is formed by reactive sputtering on a substrate. Two targets, one of aluminum and one of germanium, are used in the sputtering in a mixed atmosphere having at least nitrogen gas. Alternatively, a single target using an aluminum germanium alloy can be used. A magnetic film is formed on top of this dielectric film. A second dielectric film is then formed on top of the magnetic film. An adhesive film is formed on top of the second dielectric film and a second substrate adhered thereto.
REFERENCES:
patent: 5055353 (1991-10-01), Yamamoto
patent: 5283133 (1994-02-01), Tsutsumi
Sugahara Hiroshi
Taguchi Motohisa
Tsutsumi Kazuhiko
Kiliman Leszek
Mitsubishi Denki & Kabushiki Kaisha
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