Method of producing a deposition film of composite material

Details Method of producing a deposition film of composite material Method of producing a deposition film of composite material

1989-04-14

1990-08-28

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 20419223, C23C 1434

Patent

active

049522957

ABSTRACT:
In a method of producing a deposition film of a composite material, a plurality of sputtering targets each containing one of a plurality of different components are disposed separately in a vacuum chamber. A substrate is subjected to sputtering from the sputtering targets while being moved at an adequately high speed relative to a deposition rate from each sputtering target so that extremely thin layers of the respective components are sequentially stacked repeatedly a plurality of times to thereby form a deposition film of a composite material in which the plurality of different components are mixed uniformly.

REFERENCES:
patent: 3933644 (1976-01-01), Skinner et al.
patent: 4260466 (1981-04-01), Shirahata et al.
patent: 4279726 (1981-07-01), Baird et al.
patent: 4430183 (1984-02-01), Schuller et al.
patent: 4576699 (1986-03-01), Sato et al.
patent: 4793908 (1988-12-01), Scott et al.
Weissmantel et al., "New Developments . . . Techniques", Pro. 6th Internl. Vacuum Congr., 1974, Japan, J. Appl. Physics Suppl. 2, Pt. 1, 1974, pp. 509-512.
"New Protective Layer for an Optical Disk", reported by Krumizawa et al.

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