Positive type photoresist material

Details Positive type photoresist material Positive type photoresist material

1989-01-31

1989-12-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430921, 430923, 525353, G03C 516, G03C 1495

Patent

active

048897914

ABSTRACT:
A positive type photoresist material comprises a polymer having structural units each represented by the following formula (I) of; ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.6 represents a hydrogen atom or a hydrocarbon residue having 1 to 12 carbon atoms, each or R.sup.4 and R.sup.5 represents a hydrogen atom, a hydroxyl group or a hydrocarbon residue having 1 to 12 carbon atoms and Z represents--CH.sub.2 --.sub.n which n indicates an integer of 0 to 4.

REFERENCES:
patent: 3892570 (1975-07-01), Monaham
patent: 4439517 (1984-03-01), Irving
patent: 4504372 (1985-03-01), Kirchmaryr et al.
patent: 4618564 (1986-10-01), Demmer et al.

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