Method of producing the magnetic metallic layers having a low th

Details Method of producing the magnetic metallic layers having a low th Method of producing the magnetic metallic layers having a low th

1988-09-02

1989-12-26

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, 20419223, C23C 1434

Patent

active

048896071

ABSTRACT:
A method of producing thin magnetic layers is described. The material composition is defined by the formula REFe.sub.12-x T.sub.x, wherein RE is an element chosen from the set formed by Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, Lu and Y, wherein T is an element chosen from the set formed by Si, Ti, V, Cr, Mo and W, and wherein 1.ltoreq.x.ltoreq.4. This material is applied by means of a deposition technique from the vapor phase.

REFERENCES:
patent: 4576699 (1986-03-01), Sato et al.
patent: 4608142 (1986-08-01), Gomi et al.
patent: 4684454 (1987-08-01), Gardner

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