Spin castable resist composition and use

Details Spin castable resist composition and use Spin castable resist composition and use

1985-05-13

1986-05-27

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430273, 430286, 430326, G03C 1495

Patent

active

045915466

ABSTRACT:
Spin castable polymethylmethacrylate photoresist compositions are provided utilizing certain cinnamic acid derivatives as dyes capable of absorbing light at about 436 nm and substantially transparent to light at about 220-250 nm. The spin castable polymethylmethacrylate resist compositions are used in making semiconductor devices by multilayer photoresist methods.

REFERENCES:
patent: 3882084 (1975-05-01), Tato et al.
patent: 3895949 (1975-07-01), Akamatsu et al.
patent: 3953408 (1976-04-01), Hosoi et al.
patent: 3987215 (1976-10-01), Cortellino
patent: 4362809 (1982-12-01), Chen et al.

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