Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-08-14
1981-06-16
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415916, 20415922, 430282, 430286, 430288, 430905, 430910, G03C 168
Patent
active
042738571
ABSTRACT:
Photopolymerizable compositions are described containing a polymerizable ethylenically unsaturated monomer, a photoinitiator or initiator system, and selected acidic polymeric binders. The organic binder mixture contains a compound chosen from each of two selected classes. These photopolymerizable compositions yield superior processability, i.e., on developing and stripping, in solely aqueous alkaline media devoid of organic solvents, decreased softness and/or tackiness, and improved adhesion when compared to the prior art. The compositions are particularly useful for preparing photoresists.
REFERENCES:
patent: 2923673 (1958-05-01), Munger
patent: 2927022 (1956-07-01), Martin et al.
patent: 3469982 (1965-08-01), Celeste
patent: 3765898 (1973-10-01), Bauer et al.
patent: 3804631 (1974-04-01), Faust
patent: 3833384 (1974-09-01), Noonan et al.
patent: 3882168 (1971-09-01), Klupfel et al.
patent: 3887450 (1975-06-01), Gilano et al.
Leberzammer Ernst
Roos Leo
Brammer Jack P.
E. I. Du Pont de Nemours and Company
LandOfFree
Polymeric binders for aqueous processable photopolymer compositi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymeric binders for aqueous processable photopolymer compositi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymeric binders for aqueous processable photopolymer compositi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-155898