Process for producing successive stages of a charge coupled devi

Details Process for producing successive stages of a charge coupled devi Process for producing successive stages of a charge coupled devi

Filed on

1976-07-19

Date issued

1977-12-06

Examiner

Powell, William A.

Patent Class

Adhesive bonding and miscellaneous chemical manufacture

SubClass

Delaminating processes adapted for specified product

SubSubClass

Delaminating in preparation for post processing recycling step

Other Related Categories

29580, 156657, 156661, 156662, 357 24, H01L 21306

Type

Patent

Status

active

Patent number

040615308

Description

ABSTRACT:
An improved method for producing a plurality of closely-spaced altered regions in the surface of a first material possessing a first set of etch characteristics is disclosed. The method includes the steps of forming an etchable mask of a second material over a portion of the first material, which mask has a second set of etch characteristics and a lateral edge disposed along a selected edge of a first of the to-be-altered closely-spaced regions in the first material. A protective layer of a third material possessing a third set of etch characteristics is next formed on the exposed surface of the first material, the protective layer having a second lateral edge juxtaposed the first lateral edge. The first lateral edge of the mask is then etched to expose unprotected portions of the first material. The exposed unprotected portions of the first material are then altered by either etching or diffusion. The above-described steps are repeated as many times as required to produce a plurality of closely-spaced altered regions in the surface of the first material.

REFERENCES:
patent: 3911560 (1975-10-01), Amelio et al.
patent: 3920861 (1975-11-01), Dean
patent: 3983620 (1976-10-01), Spadea

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