Multi-graded aperture mask method

Details Multi-graded aperture mask method Multi-graded aperture mask method

1984-07-13

1986-12-30

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156640, 156651, 156656, 1566611, 313402, 430 23, 430312, 430313, 430318, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

046327266

ABSTRACT:
The process of forming a plurality of openings in an aperture mask by applying a layer of etchant resist to opposite surfaces of an aperture mask material, determining an overetch factor for the aperture mask, laying out a pattern of openings in the etchant resist on one side of the aperture mask, laying out a pattern of openings in the etchant resist on the opposite side of the aperture mask wherein the size of the openings on one side of the mask in the etchant resist increase while the size of the openings in the etchant resist on the opposite side decrease, and etching the aperture mask material through the openings in the etchant resist.

REFERENCES:
patent: 2690518 (1954-09-01), Fyler et al.
patent: 2750524 (1956-05-01), Braham
patent: 3329541 (1967-07-01), Mears
patent: 3574013 (1971-04-01), Frantzen
patent: 3652895 (1972-03-01), Tsuneta et al.
patent: 3663997 (1972-05-01), Kuznetzoff
patent: 3679500 (1972-07-01), Kubo et al.
patent: 3770434 (1973-11-01), Law
patent: 3787939 (1974-01-01), Tomita et al.
patent: 3788912 (1974-01-01), Frantzen et al.
patent: 3809945 (1974-05-01), Roeder
patent: 3839108 (1974-10-01), Leinkram
patent: 3882347 (1975-05-01), Suzuki et al.
patent: 3883770 (1975-05-01), Yamada et al.
patent: 3916243 (1975-10-01), Brown
patent: 3929532 (1972-12-01), Kuzminski
patent: 3971682 (1976-07-01), Frantzen et al.
patent: 3973965 (1976-08-01), Suzuki
patent: 4021276 (1977-05-01), Cho
patent: 4069085 (1978-01-01), Buysman et al.
patent: 4168450 (1979-09-01), Yamauchi et al.
patent: 4293792 (1981-10-01), Roberts
patent: 4303466 (1981-12-01), Thoms
patent: 4353948 (1982-10-01), Thoms
patent: 4389592 (1983-06-01), Thoms

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