Scan and tilt apparatus for an ion implanter

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

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25049221, H01J 3720

Patent

active

054060885

ABSTRACT:
An improved scan and tilt apparatus for an ion implanter wherein a wafer-receiving platen assembly is received on the end member of a multiple axis arm system which is operable to effect scanning motion of the wafer along a straight line which intercepts the wafer tilt axis in any tilt position of the platen assembly. The arm system includes a rail and linear bearing system which interconnects an input member with the end member of the arm system to restrict the scanning motion to a straight line.

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patent: 5052884 (1991-10-01), Igari
patent: 5077511 (1991-12-01), George
patent: 5229615 (1993-07-01), Brune et al.

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