High breakdown voltage semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold

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Details

257492, 257493, 257500, H01L 2974

Patent

active

052948250

ABSTRACT:
A high breakdown voltage semiconductor device is disclosed which comprises a semiconductor substrate, an insulating layer formed on the semiconductor substrate, a first semiconductor region formed on the first insulating layer and isolated at its side by an isolating region, a second semiconductor region of a first conductivity type formed in a surface portion of the first semiconductor region and having a higher impurity concentration than that of the first semiconductor region, a third semiconductor region of a second conductivity type formed in the surface region of the first semiconductor region such that it is located between the second semiconductor region and the isolating region in a manner to be spaced apart from the second semiconductor region, the third semiconductor region having a higher impurity concentration than that of the first semiconductor region.

REFERENCES:
patent: 4371886 (1983-02-01), Hartman
patent: 4807012 (1989-02-01), Beasom
patent: 5072287 (1991-12-01), Nakagawa et al.

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