Rapid thermal oxidation of silicon in an ozone ambient

Details Rapid thermal oxidation of silicon in an ozone ambient Rapid thermal oxidation of silicon in an ozone ambient

1992-07-22

1994-03-15

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437237, 437243, H01L 2102

Patent

active

052945715

ABSTRACT:
Disclosed are methods for preparing SiO.sub.2 layers in semiconductor devices by the rapid thermal oxidation of silicon in an ozone ambient.

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