Sputtered films of bismuth/tin oxide

Details Sputtered films of bismuth/tin oxide Sputtered films of bismuth/tin oxide

1987-03-26

1989-02-21

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419226, 20419227, C23C 1434, C23C 1408

Patent

active

048062219

ABSTRACT:
A novel metal oxide sputtered film comprising bismuth and tin is disclosed, as well as a method for sputtering such a film and a low emissivity coated article comprising such a film.

REFERENCES:
patent: Re27473 (1972-09-01), Mauer
patent: 2825687 (1958-03-01), Preston et al.
patent: 4094763 (1978-06-01), Gillery et al.
patent: 4113599 (1978-09-01), Gillery
patent: 4166018 (1979-08-01), Chapin
patent: 4201649 (1980-05-01), Gillery
patent: 4327967 (1982-05-01), Groth
patent: 4349425 (1982-09-01), Miyake et al.
patent: 4462883 (1984-07-01), Hart

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