Method of making low emissivity film for high temperature proces

Details Method of making low emissivity film for high temperature proces Method of making low emissivity film for high temperature proces

1986-12-29

1989-02-21

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419226, 20419215, C23C 1434

Patent

active

048062200

ABSTRACT:
A multiple-layer, high transmittance, low emissivity coated article which can be subjected to high temperature processing such as bending, annealing, tempering, laminating or glass welding as a result of titanium-containing primer layers is disclosed.

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patent: 4497700 (1985-02-01), Groth et al.
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patent: 4650557 (1987-03-01), Bitter

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