Plasma processing equipment and gas discharging device

Details Plasma processing equipment and gas discharging device Plasma processing equipment and gas discharging device

1997-01-31

1998-11-10

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912151, 2191214, 156345, 118723R, B23K 1000

Patent

active

058347305

ABSTRACT:
A gas discharging device is provided which has a function as one of opposing electrodes to plasmanize a reaction gas and executes film formation and etching with a plasma gas. The device comprises a base body having a recess portion at its central portion and a through-hole for introducing a gas into the recess portion, a gas distributing plate provided in the recess portion for introducing the gas in a radial direction, and an annular gas discharging member for discharging the gas introduced by the gas distributing plate.

REFERENCES:
patent: 4750980 (1988-06-01), Hynecek
patent: 5091217 (1992-02-01), Hey et al.
patent: 5647945 (1997-07-01), Matuse et al.
patent: 5695564 (1997-12-01), Imahashi
patent: 5698062 (1997-12-01), Sakamoto et al.

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