Photoresist formulations

Details Photoresist formulations Photoresist formulations

1979-11-05

1981-05-19

Kendall, Ralph S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430315, 430319, 430525, 430920, 427 96, 427 98, 148 614R, H05K 318

Patent

active

042686105

ABSTRACT:
Photoresist compositions with improved adhesion properties are provided for use in making printed circuit boards, lithographic plates, relief image plates or cylinders and for other applications in the graphic arts. The subject invention also provides for methods and photoresist elements utilizing the photoresist compositions. The photoresist compositions include, in addition to a photopolymerizable compound, a photo initiator, a polymeric binder, and other optional additives and N-substituted benzotriazoles which serve as improved adhesion promoters.

REFERENCES:
patent: 3622334 (1971-11-01), Hurley et al.
patent: 3645772 (1972-02-01), Jones

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