Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-06-07
2000-01-11
Hardy, David B.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257 49, 257 59, 257344, 257350, 257408, H01L 2701, H01L 2712, H01L 310392, H01L 2904
Patent
active
060139285
ABSTRACT:
An insulated-gate field-effect transistor adapted to be used in an active-matrix liquid-crystal display. The channel length, or the distance between the source region and the drain region, is made larger than the length of the gate electrode taken in the longitudinal direction of the channel. Offset regions are formed in the channel region on the sides of the source and drain regions. No or very weak electric field is applied to these offset regions from the gate electrode.
REFERENCES:
patent: 4068020 (1978-01-01), Reuschel
patent: 4103297 (1978-07-01), McGreivy et al.
patent: 4239346 (1980-12-01), Lloyd
patent: 4365013 (1982-12-01), Ishioka et al.
patent: 4378417 (1983-03-01), Maruyama et al.
patent: 4420870 (1983-12-01), Kimura
patent: 4468855 (1984-09-01), Sasaki
patent: 4528480 (1985-07-01), Unagami et al.
patent: 4591892 (1986-05-01), Yamazaki
patent: 4597160 (1986-07-01), Ipri
patent: 4646426 (1987-03-01), Sasaki
patent: 4680580 (1987-07-01), Kawahara
patent: 4727044 (1988-02-01), Yamazaki
patent: 4740829 (1988-04-01), Nakagiri et al.
patent: 4755865 (1988-07-01), Wilson et al.
patent: 4818077 (1989-04-01), Ohwada et al.
patent: 4860069 (1989-08-01), Yamazaki
patent: 4862237 (1989-08-01), Morozumi
patent: 4888305 (1989-12-01), Yamazaki et al.
patent: 4891330 (1990-01-01), Guha et al.
patent: 4897360 (1990-01-01), Guckel et al.
patent: 4905066 (1990-02-01), Dohjo et al.
patent: 4938565 (1990-07-01), Ichikawa
patent: 4949141 (1990-08-01), Busta
patent: 4959700 (1990-09-01), Yamazaki
patent: 4969025 (1990-11-01), Yamamoto et al.
patent: 4969031 (1990-11-01), Kobayashi et al.
patent: 4986213 (1991-01-01), Yamazaki et al.
patent: 5003356 (1991-03-01), Wakai et al.
patent: 5012228 (1991-04-01), Matsuda et al.
patent: 5023679 (1991-06-01), Shibata
patent: 5051570 (1991-09-01), Tsujikawa et al.
patent: 5055899 (1991-10-01), Wakai et al.
patent: 5056895 (1991-10-01), Kahn
patent: 5077223 (1991-12-01), Yamazaki
patent: 5084905 (1992-01-01), Sasaki et al.
patent: 5132754 (1992-07-01), Serikawa et al.
patent: 5132821 (1992-07-01), Nicholas
patent: 5142344 (1992-08-01), Yamazaki
patent: 5235195 (1993-08-01), Tran et al.
patent: 5245452 (1993-09-01), Nakamura et al.
patent: 5250818 (1993-10-01), Saraswat et al.
patent: 5250931 (1993-10-01), Misawa et al.
patent: 5289030 (1994-02-01), Yamazaki et al.
patent: 5302845 (1994-04-01), Kumagai et al.
patent: 5308998 (1994-05-01), Yamazaki et al.
patent: 5313077 (1994-05-01), Yamazaki
patent: 5315132 (1994-05-01), Yamazaki
patent: 5327901 (1994-07-01), Wakai et al.
patent: 5495353 (1996-02-01), Yamazaki et al.
patent: 5521107 (1996-05-01), Yamazaki et al.
patent: 5543636 (1996-08-01), Yamazaki
patent: 5612799 (1997-03-01), Yamazaki et al.
patent: 5744818 (1998-04-01), Yamazaki et al.
Wilmsen, "Chemical Composition and Formation of Thermal and Anodic Oxide/III-V Compound Semiconductor Interfaces", J. Vac. Sci. Technol., vol. 19, No. 3, Sep./Oct. 1981, pp. 279-287.
Wallmark et al., "Field-Effect Transistors Physics, Technology and Applications" 1968, p. 199.
Cobbold, "Theory and Applications of Field-Effect Transistors" 1971.
Millman et al. "Microelectronics Second Edition", McGraw-Hill Book Company, 1988, p. 143.
Hiroki Masaaki
Mase Akira
Nemoto Hideki
Takemura Yasuhiko
Uochi Hideki
Hardy David B.
Robinson Eric J.
Semiconductor Energy Laboratory Co,. Ltd.
Wilson Allan R.
LandOfFree
Semiconductor device having interlayer insulating film and metho does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor device having interlayer insulating film and metho, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having interlayer insulating film and metho will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1464340