Method of polishing CVD diamond films by oxygen plasma

Details Method of polishing CVD diamond films by oxygen plasma Method of polishing CVD diamond films by oxygen plasma

1997-10-27

2000-01-11

Stinson, Frankie L.

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 38, 216 81, 20419234, H01L 21302

Patent

active

060131918

ABSTRACT:
A method for polishing the surface of a diamond film with a low power density plasma in a reactor which comprises disposing O.sub.2 gas and a fluorinated gas such as SF.sub.6, NF.sub.3, and C.sub.2 F.sub.6 in the reactor, providing power to the reactor so that the power density in the reactor is between about 1.0 watts/cm.sup.2 and about 1.1 watts/cm.sup.2 for a first duration, and maintaining temperature in the reactor at between about 200.degree. to about 400.degree.. The method may alternatively comprise disposing a sputter gas such as Ar,O.sub.2 or N.sub.2 in the reactor, providing power to the reactor so that the power density in the reactor is between about 3.0 watts/cm.sup.2 and about 7.5 watts/cm.sup.2 for a first duration, and performing a sputter etch, disposing O.sub.2 gas and a fluorinated gas such as SF.sub.6, NF.sub.3, and C.sub.2 F.sub.6 in the reactor, and providing power to the reactor so that the power density in the reactor is between about 1.5 watts/cm.sup.2 and about 3.0 watts/cm.sup.2 for a second duration.

REFERENCES:
patent: 4957591 (1990-09-01), Sato et al.
patent: 5334283 (1994-08-01), Parikh et al.
patent: 5344526 (1994-09-01), Nishibayashi et al.
patent: 5417798 (1995-05-01), Nishibayashi et al.
patent: 5458733 (1995-10-01), Tessmer
Lee, D.-G. et al, "Ion-beam polishing of diamond thin films" Mat. Res. Soc. Sump. Proc. vol. 354, pp. 699-703, Jan. 1995.
Llewellyn, I. et al, "Plasma etching and deposition as a method of polishing CVD diamond" SPIE, vol. 2286 Window and Dome Technologies and Materials IV, pp. 198-204, Jul. 1994.
Ilias, S. et al, "Planarization of diamond thin film surfaces by ion beam etching at grazing incidence angle" Diamond and Related Materials, 5, pp. 835-839, Jun. 1996.
Sirineni, G.M.R., et al "Reactive ion etching of diamond as a means of enhancing chemically assisted mechanical polishing efficiency" Diamond Relat. Mater. 6(8) pp. 952-958, Aug. 1997.
Buchkremer-Hermanns, et al., "ECR Plasma Polishing of CVD Diamond Films", 1996, Diamond and Related Materials 5, Elsevier Science S.A., pp. 845-849. Jun. 1996.
Vivensang, et al., "Surface Smoothing of Diamond Membranes by Reactive Ion Etching Process", 1996, Diamond and Related Materials 5, Elsevier Science S.A., pp. 840-844. Jun. 1996.

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