Photosensitive composition

Details Photosensitive composition Photosensitive composition

1997-06-20

1998-12-15

Chea, Thorl

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430157, 430175, 430176, 4302811, 4302831, 4302851, 430913, G03F 700

Patent

active

058494634

ABSTRACT:
A photosensitive composition comprising (1) a compound having at least one addition-polymerizable ethylenically unsaturated double bond, (2) an acidic vinyl copolymer soluble or swellable in alkaline water, which contains, in its molecule, a vinyl monomer having an aromatic hydroxyl group, as a constituting unit, (3) a photopolymerization initiator, and (4) a diazo resin, wherein the diazo resin is a copolycondensed compound which contains, in its molecule, an aromatic compound having a carboxyl group and/or a hydroxyl group, and an aromatic diazonium compound, as constituting units.

REFERENCES:
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 5059511 (1991-10-01), Higashi et al.
patent: 5080999 (1992-01-01), Imai et al.
patent: 5427887 (1995-06-01), Konuma et al.

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