Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-11-28
1998-12-15
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 430269, 264401, 522170, 522100, 522 16, 522 8, 522 20, G03F 7028, G03F 720
Patent
active
058494596
ABSTRACT:
A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).
REFERENCES:
patent: 4839401 (1989-06-01), Waknine
patent: 4942060 (1990-07-01), Grossa
patent: 5236967 (1993-08-01), Ohkawa et al.
patent: 5364741 (1994-11-01), Huynh-Tran et al.
patent: 5368985 (1994-11-01), Rutsch et al.
patent: 5399770 (1995-03-01), Leppard et al.
patent: 5494618 (1996-02-01), Sitzmann et al.
patent: 5496685 (1996-03-01), Farber et al.
63-92607: English Abstract of Japanese document 63-92607, Ueda et al, Patent Abstracts of Japan, vol. 12, No. 326, published Sep. 5, 1988.
88-151525: English Abstract of Japanese Document 63-92607, Sumitomo Chem IND KK, from WPIDS File, Derwent Information Ltd, document dated Apr. 23, 1988 as issue date.
109: 191579: English Abstract of Japanese Document 63-92607, Ueda et al, from Chemical Abstracts, ACS, Columbus Ohio, document dated Apr. 23, 1988.
Registry No. 2440-22-4 of Chemical Abstracts, ACS, Tinuvin P.
Registry No 84268-33-7 of Chemical Abstracts, ACS, Tinuvin 1130.
Hagiwara Tsuneo
Tamura Yorikazu
Hamilton Cynthia
Teijin Seiki Co. Ltd.
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