Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-02-17
1999-11-09
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
059811102
ABSTRACT:
A method for repairing a defect in an opaque layer of a photomask by applying a photoresist layer over the opaque layer and then removing the photoresist over the defect to reveal the defect which is repaired by a wet etch. The repair procedure of the present invention is "self-aligning" in that the portion of the photoresist layer covering the defect, prior to being removed, extends to the edges of the defect, so that only this portion of the photoresist layer is removed to reveal only the defect in the opaque layer.
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Peiyang Yan et al., "Effect of Laser Mask Repair Induced Residue and Quartz Damage in Sub-half-micron DUV Wafer Process," Proceedings of 15th Annual Symposium on Photomask Technology and Management, (Sep. 20-22, 1995) SPIE vol. 2621) pp. 158-166.
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George Merrilou
Neary Timothy E.
International Business Machines - Corporation
Rosasco S.
Walter, Jr. Howard J.
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