Negative-acting photoresist imaging system

Details Negative-acting photoresist imaging system Negative-acting photoresist imaging system

1984-07-19

1985-10-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430275, 430271, 430276, 430280, 430287, 430926, 430916, 430950, 430527, G03C 168, G03C 170, G03C 194

Patent

active

045446229

ABSTRACT:
A negative-acting photoresist imaging system is provided having a substrate, a metal layer, a latently sensitized, crosslinkable, negative-acting photoresist base layer, and a negative-acting photoresist layer. The system may further have an organic protective coat between the metal layer and the base layer, a matte top layer, and/or an antistatic layer on the back side of the substrate.

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patent: 3954475 (1976-05-01), Bonham et al.
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patent: 4228232 (1980-10-01), Rousseau
patent: 4316949 (1982-02-01), Petrellis et al.
patent: 4476215 (1984-10-01), Kausch

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