Plasma generating device and method of plasma processing

Details Plasma generating device and method of plasma processing Plasma generating device and method of plasma processing

1991-12-30

1993-06-22

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156662, H01L 2100

Patent

active

052214273

ABSTRACT:
A plasma generating device and a method for etching a minute region of a substrate under atmospheric pressure are disclosed. A gas containing helium as the main ingredient is glow discharged under atmospheric pressure, a halide is added to the discharge so as to activate the halogen element, and a solid material (substrate) such as silicon is chemically etched by using the radicals. At that time, a magnetic field acts on the discharge so as to draw out electrons and ions to the surface of the substrate, thereby increasing the radical density in the vicinity of the surface of the substrate and the etching rate.

REFERENCES:
patent: 4341616 (1982-07-01), Nagatomo et al.
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4979467 (1990-12-01), Kamaji et al.
patent: 5048457 (1991-09-01), Hyman et al.

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