Removing hardened organic materials during fabrication of integr

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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156643, 156656, 156657, 1566591, 156668, 427259, 427336, H01L 2170

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active

043461255

ABSTRACT:
In an integrated circuit fabrication sequence, a hardened mask pattern adhered to an underlying substrate is removed from the substrate by a solvent that comprises anhydrous hydrazine and dimethyl sulfoxide. The solvent rapidly penetrates the interface between the pattern and the underlying substrate and quickly breaks the adhesive bonds therebetween. Other materials (e.g., Al, Si, SiO.sub.2) in the structure being fabricated are not deleteriously affected by the solvent.

REFERENCES:
patent: 3873361 (1975-03-01), Franco et al.
patent: 4218283 (1980-08-01), Saiki et al.
patent: 4238528 (1980-12-01), Angelo et al.
Audrieth et al., "Non-Aqueous Solvents", pp. 129-134, John Wiley & Sons, Inc., N.Y., .COPYRGT.1953.
Moran et al., "High Resolution, Steep Profile, Resist Patterns", The Bell System Technical Journal, May-Jun. 1979, vol. 58, No. 5.
Hom-ma et al., "A New Lift-Off Metallization Technique for High Speed Bipolar LSI's", Central Research Laboratory, Hitachi, Ltd., Japan, .COPYRGT.1979, IEEE.

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