Aperture for off-axis illumination and projection exposure appar

Photocopying – Projection printing and copying cameras – Step and repeat

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355 55, 355 67, 359227, 359232, G03B 2742, G03B 2752, G03B 2754

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057267383

ABSTRACT:
An aperture for an off-axis illumination (OAI) and a projection exposure apparatus which employs the same. In the aperture for an OAI having a light-intercepting region and a light-transmitting region, at least a portion of the light-transmitting region is prismoidal and diffracts incident light toward the periphery of the condenser lens. Accordingly, light intensity is increased due to an increased light-transmitting region, which can lead to a reduction in the exposure time required for photolithography procedures and to an increased productivity of semiconductor devices.

REFERENCES:
patent: 5348837 (1994-09-01), Fukuda et al.
patent: 5446587 (1995-08-01), Kang et al.
patent: 5552856 (1996-09-01), Shiraishi et al.

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