Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1996-09-26
1998-12-29
Chaudhuri, Olik
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257301, 257330, H01L 27108, H01L 2976, H01L 2994, H01L 31119
Patent
active
058545000
ABSTRACT:
A dynamic gain memory cell of a DRAM cell array includes a planar MOS transistor as a selection transistor and a vertical MOS transistor as a memory transistor, which are connected to one another via a common source/drain region. The memory transistor has a gate electrode of doped silicon, which is disposed along at least one side of a trench. In the trench, an oppositely doped silicon structure is provided, which with the gate electrode of the memory transistor forms a diode, which is connected to the common source/drain region via a contact.
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patent: 5308783 (1994-05-01), Krautschneider et al.
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patent: 5559357 (1996-09-01), Krivokapic
patent: 5661322 (1997-08-01), Williams et al.
"Fully Scalable Gain Memory Cell for Future Drams" (Krautschneider et al.), Microelectronic Engineering 15, 1991, pp. 367-370, Elsevier.
"Planar Gain Cell for Low Voltage Operation and Gigabit Memories" Krautschneider et al., 1995 Symposium on VLSI Technology, Siemens AG Corporate Research and Development.
Chaudhuri Olik
Greenberg Laurence A.
Lerner Herbert L.
Siemens Aktiengesellschaft
Weiss Howard
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