Electron beam shaping aperture in low voltage, field-free region

Details Electron beam shaping aperture in low voltage, field-free region Electron beam shaping aperture in low voltage, field-free region

1992-05-20

1993-01-26

Blum, Theodore M.

Electric lamp and discharge devices: systems

Cathode ray tube circuits

Plural concentrating, accelerating, and/or de-accelerating...

313414, H01J 2946, H01J 2956

Patent

active

051824922

ABSTRACT:
Energetic electrons emitted by heated cathodes in a multi-beam color cathode ray tube (CRT) are directed to a low voltage beam forming region (BFR) of an electron gun, with the thus formed electron beams then directed through a high voltage main focus lens for focusing the beams on a display screen of the CRT. The BFR includes a G.sub.2 electron having three spaced inline apertures each disposed within an essentially electrostatic field-free region and through each of which a respective electron beam passes. Each G.sub.2 aperture intercepts an outer portion of an associated electron beam to provide an electron beam cross sectional shape which compensates for the asymmetric focusing effect of the main focus lens in correcting for beam spherical aberration to provide a rotationally symmetric electron beam spot on the display screen. The invention is also adapted for use in a monochrome, single electron beam CRT to provide a desired electron beam spot shape for optimum display pixel density and/or to eliminate display discontinuities and provide a smooth video image display.

REFERENCES:
patent: 2070319 (1937-02-01), Rudenbeg
patent: 2072957 (1937-03-01), McGee
patent: 2111941 (1938-03-01), Schlesinger
patent: 2128581 (1938-08-01), Garrdner
patent: 2135941 (1938-11-01), Hirmann
patent: 2185590 (1940-01-01), Epstein
patent: 2202631 (1940-05-01), Headrick
patent: 2209159 (1940-07-01), Gorlich et al.
patent: 2213688 (1940-09-01), Broadway et al.
patent: 2217168 (1940-10-01), Hefele et al.
patent: 2229766 (1941-01-01), Nicoll et al.
patent: 2260313 (1941-10-01), Gray
patent: 2888606 (1959-05-01), Beam
patent: 3798478 (1974-03-01), Say
patent: 3887830 (1975-06-01), Spencer
patent: 3919588 (1975-11-01), Parks et al.
patent: 3928784 (1975-12-01), Weijland
patent: 4009410 (1977-02-01), Pommier et al.
patent: 4218635 (1980-08-01), Bedard et al.
patent: 4268777 (1981-05-01), van Roosmalen
patent: 4388556 (1983-06-01), Rao
patent: 4467243 (1984-08-01), Fukushima et al.
patent: 4540916 (1985-09-01), Maruyama et al.
patent: 4549113 (1985-10-01), Rao
patent: 4620133 (1986-10-01), Morrell et al.
patent: 4628224 (1986-12-01), Collins et al.
patent: 4724359 (1988-02-01), Roussin
patent: 4764704 (1988-08-01), New et al.
patent: 4766344 (1988-08-01), Say
patent: 4825121 (1989-04-01), Miyazaki
patent: 4886998 (1989-12-01), Endo
patent: 5066887 (1991-11-01), New

Affiliated with

Also associated with

Rating

Electron beam shaping aperture in low voltage, field-free region does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam shaping aperture in low voltage, field-free region, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam shaping aperture in low voltage, field-free region will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1414519