Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-10-03
1992-05-05
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430176, G03C 172
Patent
active
051107082
ABSTRACT:
A radiation-sensitive mixture, essentially consisting of
REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4689288 (1987-08-01), Buiguez et al.
patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 4889789 (1989-12-01), Stahlhofen
patent: 4980263 (1990-12-01), Sekiya
Applications of Photoinitiated Cationic Polymerization . . . Crivello, Polymer Sci., 48, p. 65-69.
Polymeric Material Science and Engineering, A.C.S., vol. 61, pp. 417-421 (1989).
Journal Polym. Sci., Pat A, Polym. Chem. Ed., vol. 24, pp. 2971-2980 (1986).
Pampalone "Solid State Technology" Jun. 1984, 114-129 (Novolak Resins Used in Positive Resist System).
BASF - Aktiengesellschaft
McCamish Marion E.
Rodee Christopher D.
LandOfFree
Radiation-sensitive mixture and production of relief images does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive mixture and production of relief images, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture and production of relief images will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1411803