Negative-working dichromate photoresist composition, process for

Details Negative-working dichromate photoresist composition, process for Negative-working dichromate photoresist composition, process for

1983-08-24

1985-12-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 28, 430289, G03C 166, G03C 176, G03C 178

Patent

active

045566267

ABSTRACT:
A method is shown in which a black, light-absorbing matrix is formed on the viewing surface of a rear-projection polymethyl methacrylate TV viewing screen in which there is use of a negative working photoresist composition comprising an aqueous solution of polyvinyl alcohol, a water-soluble dichromate and acetone as essentially the sole wetting agent.

REFERENCES:
patent: 3317319 (1967-05-01), Mayaud
patent: 3471294 (1969-10-01), van der Sander
patent: 3558310 (1971-01-01), Mayaud
patent: 3598640 (1971-08-01), Bennett
patent: 3832032 (1974-08-01), Shimada
patent: 3966474 (1976-06-01), Harper
patent: 4431720 (1984-02-01), Sugarman

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