Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1988-05-26
1990-01-02
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430316, 430317, 156643, G03C 516
Patent
active
048913030
ABSTRACT:
A method for patterning an integrated circuit workpiece (10) includes forming a first layer (16) of organic material on the workpiece surface to a depth sufficient to allow a substantially planar outer surface (36) thereof. A second, polysilane-based resist layer (22) is spin-deposited on the first layer (16). A third resolution layer (24) is deposited on the second layer (22). The resolution layer (24) is selectively exposed and developed using standard techniques. The pattern in the resolution layer (24) is transferred to the polysilane layer (22) by either using exposure to deep ultraviolet or by a fluorine-base RIE etch. This is followed by an oxygen-based RIE etch to transfer the pattern to the surface (18) of the workpiece (10).
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Douglas Monte A.
Garza Cesar M.
Johnson Roland
Anderson Rodney M.
Dees Jos,e G.
Sharp Melvin
Sorensen Douglas A.
Texas Instruments Incorporated
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