Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-06-08
1990-01-02
Straub, Gary P.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156610, 156613, C30B 2502
Patent
active
048910910
ABSTRACT:
Method of MOVPE growing a compound semiconductor material, for example GaAs, on a substrate, for example Si. Sodium ions are first introduced onto the substrate surface as by immersing it in a cleaning solution containing sodium. A two-step MOVPE process is then employed to grow device quality single crystal compound semiconductor material on the surface of the substrate.
REFERENCES:
patent: 3370980 (1968-02-01), Anderson
patent: 3725284 (1973-04-01), Touchy
patent: 3963538 (1976-06-01), Broadie et al.
patent: 4032418 (1977-06-01), Antula
patent: 4042447 (1977-08-01), Reitz
patent: 4062706 (1977-12-01), Ruehrwein
patent: 4147571 (1979-04-01), Stringfellow et al.
patent: 4177298 (1979-12-01), Shigeta et al.
patent: 4177321 (1979-12-01), Nishizawa
patent: 4255208 (1981-03-01), Deutscher et al.
patent: 4368098 (1983-01-01), Manaseuit
patent: 4407694 (1983-10-01), Eu et al.
patent: 4504331 (1985-03-01), Kuech et al.
patent: 4537651 (1985-08-01), Shuskus et al.
patent: 4561916 (1985-12-01), Akiyama et al.
patent: 4588451 (1986-05-01), Vernon
Mizuguchi et al., "MOCVD GaAs Growth on Ge (100) and Si (100) Substrates", J. Crys. Growth 77(1986), pp. 509-514.
Shastry et al., "Devices on GaAs Directly Grown on (100)-Si By Low Pressure Metalorganic Vapor Phase Epitaxy", 3rd Int. Workshop on the Physics of Semiconductor Devices, Madrus, India, 1985.
Christou et al., "Low Temperature Epitaxial Growth of GaAs on (100) Silicon Substrates", Electronics Letters 21 (1985), pp. 406-408.
Akiyama et al., "Growth of High Quality GaAs Layers on Si Substrates by MOCVD", J. Crys. Growth 77(1986), pp. 490-497.
Akiyama et al., "Growth of GaAs on Si by MOCVD", J. Crys. Growth 68 (1984), pp. 21-26.
Norris et al., "Reduced Pressure MOVPE Growth and Characterization . . .", 68 (1984), pp. 437-444.
Tsaur et al., "Molecular Beam Epitaxy of GaAs and AlGaAs on Si", Appl. Phys. Lett. 45 (1984), pp. 535-536.
Zemon et al., "Photoluminescence and Photoluminescence Excitation Spectra of GaAs Grown Directly on Si", 58 (1986), pp. 457-460, Solid State Comm.
Breneman R. Bruce
Cannon, Jr. James J.
GTE Laboratories Incorporated
Keay David M.
Straub Gary P.
LandOfFree
Method of epitaxially growing compound semiconductor materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of epitaxially growing compound semiconductor materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of epitaxially growing compound semiconductor materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1381877