Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1991-11-22
1994-10-25
Jackson, Jerome
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257297, 257301, 257302, 257306, H01L 2978
Patent
active
053592158
ABSTRACT:
A DRAM includes an N-type well formed on a main surface of a P-type semiconductor substrate, an N-type impurity region formed on the main surface of the P-type semiconductor substrate, a P-type impurity region formed in the N-type well to be a storage node of a memory capacitor, and a polycrystalline silicon layer for connecting the P-type impurity region and the N-type impurity region. The N-type impurity layer, the P-type impurity layer, and the polycrystalline silicon layer constitute the storage node of the memory capacitor, and electrons of minority carriers flowing from the substrate to the N-type impurity layer are recombined with holes flowing from the N-type well to the P-type impurity layer.
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patent: 4156939 (1979-05-01), Takemae et al.
patent: 4392210 (1983-07-01), Chan
patent: 4927779 (1990-05-01), Dhong et al.
patent: 4937645 (1990-06-01), Ootsuka et al.
patent: 5006909 (1991-04-01), Kosa
Jackson Jerome
Mitsubishi Denki & Kabushiki Kaisha
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