Thermal trench isolation

Fishing – trapping – and vermin destroying

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437 69, 437 72, 148DIG50, H01L 2176

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active

054729041

ABSTRACT:
A process useful for isolating active areas of semiconductor devices in which an isolation trench is created in a substrate, the isolation trench being lined with an oxidation barrier and filled with a thick film. An oxidation step is performed in which the thick film is oxidized. The oxidation is self-limiting as the oxidation barrier prevents the substrate surrounding the trench from being oxidized.

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