4. Fishing, trapping, and vermin destroying

Nanseng Jeng

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Assisted local oxidation of silicon

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Patent

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Barrier in gate stack for improved gate dielectric integrity

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

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Barrier in gate stack for improved gate dielectric integrity

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Barrier in gate stack for improved gate dielectric integrity

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Barrier in gate stack for improved gate dielectric integrity

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

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Profile ID: LFUS-PAI-P-88569

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