Method of etching silicon nitride

Details Method of etching silicon nitride Method of etching silicon nitride

1994-08-05

1995-12-05

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 793, H01L 2100

Patent

active

054725623

ABSTRACT:
Etch baths having phosphoric acid, nitric acid and hydrofluoric acid and used to selectively remove silicon nitride or silicon with respect to silicon oxide have enhanced initial selectivity when silicon is added to the initial bath. The silicon may be added in the form of soluble silicon compounds such a hexafluorosilicic acid or ammonium fluorosilicate.

REFERENCES:
patent: 5310457 (1994-05-01), Ziger
patent: 5348617 (1994-09-01), Braymen

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