Laser processing apparatus and laser processing process

Details Laser processing apparatus and laser processing process Laser processing apparatus and laser processing process

1996-10-30

1999-04-06

Niebling, John F.

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438160, 438162, 438166, H01L 2100, H01L 2184

Patent

active

058917640

ABSTRACT:
A laser processing process which comprises laser annealing a silicon film 2 .mu.m or less in thickness by irradiating a laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more, and preferably, 100 nsec or more.
A laser processing apparatus which comprises a laser generation device and a stage for mounting thereon a sample provided separately from said device, to thereby prevent transfer of vibration attributed to the movement of the stage to the laser generation device and the optical system. A stable laser beam can be obtained to thereby improve productivity.

REFERENCES:
patent: 3848104 (1974-11-01), Locke
patent: 4046618 (1977-09-01), Chaudhari et al.
patent: 4059461 (1977-11-01), Fan et al.
patent: 4083272 (1978-04-01), Miller
patent: 4160263 (1979-07-01), Christy et al.
patent: 4234358 (1980-11-01), Celler et al.
patent: 4249960 (1981-02-01), Schnable et al.
patent: 4309225 (1982-01-01), Fan et al.
patent: 4328553 (1982-05-01), Fredrikson et al.
patent: 4341569 (1982-07-01), Yaron et al.
patent: 4370175 (1983-01-01), Levatter
patent: 4439245 (1984-03-01), Wu
patent: 4463028 (1984-07-01), Laude
patent: 4468551 (1984-08-01), Neiheisel
patent: 4469551 (1984-09-01), Laude
patent: 4545823 (1985-10-01), Drowley
patent: 4734550 (1988-03-01), Imamura et al.
patent: 4764485 (1988-08-01), Loughran et al.
patent: 4803528 (1989-02-01), Pankove
patent: 4835704 (1989-05-01), Eichelberger et al.
patent: 4862227 (1989-08-01), Tsuge et al.
patent: 4937618 (1990-06-01), Ayata et al.
patent: 4956539 (1990-09-01), Uesugi et al.
patent: 4970366 (1990-11-01), Imatou et al.
patent: 5217921 (1993-06-01), Kaido et al.
patent: 5219786 (1993-06-01), Noguchi et al.
patent: 5221365 (1993-06-01), Noguchi et al.
patent: 5313078 (1994-05-01), Yamazaki et al.
patent: 5352291 (1994-10-01), Zhang et al.
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5413958 (1995-05-01), Imahashi et al.
patent: 5424244 (1995-06-01), Zhang et al.
patent: 5477073 (1995-12-01), Wakai et al.
patent: 5561081 (1996-10-01), Takenuchi et al.
patent: 5578520 (1996-11-01), Zhang et al.
patent: 5612251 (1997-03-01), Lee
patent: 5622814 (1997-04-01), Miyata et al.
patent: 5648277 (1997-07-01), Zhang et al.
patent: 5696003 (1997-12-01), Makita et al.
patent: 5712191 (1998-01-01), Nkajima et al.
patent: 5756364 (1998-05-01), Tanaka et al.
"Laser Annealing of Semiconductors", J.M. Poate (ed.) Epitaxy by Pulsed Annealing of Io-Implanted Silicon, Foti et al., (1982) Academic Press, pp. 203-245. Month unknown.
Young et al., "Effect of Pulse Duration on the Annealing of Ion Implanted Silicon With a XeCl Excimer Laser and Solar Cells", in Laser-Solid Interactions and Transient Thermal Processing of Materials, 1983, pp. 401-406. Month unknown.
Biegelsen et al., "Laser-Induced Crystallization of Silicon on Bulk Amorphous Substracts : An Overview" in Laser-Solid Interactions and Transient Thermal Processing of Materials, 1983, pp. 537-548. Month unknown.

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