Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent
1996-11-13
1999-04-06
Tsai, Jey
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
438479, 438526, 438286, H01L 2100, H01L 2184
Patent
active
058917578
ABSTRACT:
A field-effect transistor has a source region, a drain region, a gate electrode, and a low resistivity layer. The source and drain regions are of a first conductivity type and formed as surface regions of a semiconductor layer formed on one of an insulating substrate and a semi-insulating substrate. The gate electrode is formed on a channel region between the source region and the drain region. The low resistivity layer serving as a shield layer is disposed underneath and spaced apart from the source, drain and channel regions, and overlaps the source region with an overlap area being larger than an overlap area between the low resistivity layer and the drain region. The arrangement enables the prevention of noise margin reduction and erroneous operation.
REFERENCES:
patent: 4864377 (1989-09-01), Widdershoven
patent: 4923824 (1990-05-01), Fertig et al.
patent: 5488243 (1996-01-01), Tsuruta et al.
patent: 5514608 (1996-05-01), Williams et al.
patent: 5548150 (1996-08-01), Omura et al
"Suppression of Drain Conductance Transients, Drain Current Oscillations, and Low-Frequency Generation-Recombinatin Noise in GaAs FET's Using Buried Channels" Canfield et al: IEEE Transactions on Electron Devices, vol. ED-33; No. 7; Jul. 1986; pp. 925-928.
"Effects of Neutral Buried p-Layer on High-Frequency Performance of GaAs MESFET's " Onodera et al IEEE Transactions on Electron Devices, vol 38; No. 3; Mar. 1991; pp. 429-436.
"Buried-Channel GaAs MESFET's with Frequency-Independent Output Conductance" Canfield et al IEEE Electron Device LEtters, vol. EDL-8; No. 3; Mar. 1987 pp. 88-89.
NEC Corporation
Tsai Jey
LandOfFree
Method for forming a field-effect transistor having difference i does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming a field-effect transistor having difference i, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a field-effect transistor having difference i will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1370999