Substrate heating mechanism

Details Substrate heating mechanism Substrate heating mechanism

1993-07-23

1995-12-26

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427573, 118719, 118724, 118725, 118728, 20429807, 20429809, 20419212, C23C 1400

Patent

active

054786096

ABSTRACT:
A substrate-heating mechanism has a heat source for heating a substrate for heating a substrate face side reverse to a film formation face in a film deposition on the film formation surface of the substrate held on a substrate holder in a vacuum chamber, the mechanism comprises a second vacuum chamber for maintaining vacuum the substrate face reverse to the film formation face.

REFERENCES:
patent: 4951603 (1990-08-01), Yoshino
patent: 5033407 (1991-07-01), Mizuno
patent: 5113929 (1992-05-01), Nakagawa
patent: 5180432 (1993-01-01), Hansen
patent: 5188058 (1993-02-01), Nakai
patent: 5252131 (1993-10-01), Kiyama
patent: 5284521 (1994-02-01), Atetagawa
patent: 5332442 (1994-07-01), Kubodera

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