Photographic element and patternable mordant composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430281, 430518, 522149, 522152, G03C 176

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active

048085103

ABSTRACT:
A photographically negative-working patternable mordant composition is disclosed containing a photocrosslinkable polymer comprised of, for providing both mordanting and crosslinking sites, repeating units of the formula: ##STR1## wherein Ar is an aromatic linking group,

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Herkstroeter et al., Journal of Photochemistry, vol. 35, pp. 71-85 (1986).
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Murov, Handbook of Photochemistry, pp. 1-7 and 27-35.
Sanada et al., "New Deep UV Dyeable Negative Resist for CCD Micro Color Filter", SPIE, vol. 631, Advances in Resist Technology and Processing III (1986), pp. 187-191.
Research Disclosure, vol. 151, Nov. 1976, Item 15162.
Toshiba Kokai 79246/1984, based on Japanese Application No. 189,081/1982, filed Oct. 29, 1982.

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