Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-02-17
1996-02-20
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
216 66, 1566431, 427162, 4271632, 437129, 20419235, C23C 1436, H01L 21306, H01L 2120, C03C 2502
Patent
active
054926076
ABSTRACT:
A surface-emitting laser system includes a laser that emits a vertically divergent beam generally parallel to the substrate on which it is formed, and a turning mirror in the path of the beam that extends up from the substrate to a level well above the laser height. The extended mirror area reflects a greater portion of the beam than prior planar designs, increasing the output efficiency and providing a smoother beam pattern. One fabrication method employs a masking and ion beam milling technique that uses an accumulation of redeposited material to form the additional mirror area, with a thick mask layer that is later removed guiding the redeposition. An alternate fabrication method involves epitaxial growth of an additional layer of material above the conventional laser epilayers, with the additional layer subsequently removed from the laser region but retained in the mirror region.
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Breneman R. Bruce
Denson-Low Wanda K.
Duraiswamy Vijayalakshmi D.
Hughes Aircraft Company
McDonald Rodney G.
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