Positive radiation sensitive resist terpolymers

Details Positive radiation sensitive resist terpolymers Positive radiation sensitive resist terpolymers

1981-03-16

1982-10-19

Morgenstern, Norman

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

156643, 427 431, 430296, 430326, 528386, G03C 100, B05D 306, C23F 100

Patent

active

043550940

ABSTRACT:
This invention relates to novel terpolymers of 3-methylcyclopentene, an omega alkynoic acid and sulfur dioxide. Positive radiation sensitive films prepared from the subject terpolymers adhere well to the substrate, demonstrate resistance to cracking and erosion during development and possess excellent edge definition.

REFERENCES:
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 3935331 (1976-01-01), Poliniak et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 4097618 (1978-06-01), Poliniak
patent: 4153741 (1979-05-01), Poliniak et al.
patent: 4263385 (1981-04-01), Pampalone
Hatzakis et al., J. Electrochem. Soc., Jan. 1979, pp. 154-161.

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