Photosensitive recording element comprising migration resistant

Details Photosensitive recording element comprising migration resistant Photosensitive recording element comprising migration resistant

1987-05-12

1990-01-16

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430281, 430512, 430517, 430519, G03C 1495, G03C 168, G03C 170, G03C 176

Patent

active

048943134

ABSTRACT:
Photosensitive recording elements which possess a photosensitive recording layer which is applied to a dimensionally stable base, if necessary via one or more intermediate layers, and have good photochemical properties and a long shelf life contain a compound of the general formula (I) ##STR1## where M is a hydrogen atom or proton, an alkali metal cation, the ammonium cation or an amine cation and R.sup.1 and R.sup.2 are identical or different and are each a substituted s-triazine ring, in the photosensitive recording layer and/or any intermediate layer present, in order to control the photochemical properties.

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"Micrelectronic Engineering", 1985--Elsevier Science Publishers B.V. (North Holland).

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