Photosensitive composition comprising aryl-substituted polysilan

Details Photosensitive composition comprising aryl-substituted polysilan Photosensitive composition comprising aryl-substituted polysilan

1997-05-29

1999-11-16

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 46, 522 60, G03C 173

Patent

active

059855134

ABSTRACT:
The present invention relates to a photosensitive composition comprising a polysilane having a repeating unit represented by the following general formula (1) and a benzophenone type compound having an organic peroxide, ##STR1## wherein Ar represents a substituted or unsubstituted aryl group.

REFERENCES:
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patent: 4719273 (1988-01-01), Seyforth et al.
patent: 5372908 (1994-12-01), Hayase et al.
patent: 5776634 (1998-07-01), Ohkuma et al.
S. Hayase, et al., "Syntheses of Polysilanes with Functional Groups. 2. Polysilanes with Carboxylic Acids", Macromolecules, vol. 22, 1989, pp. 2933-2938.
J.V. Beach, et al. "Enviromentally Friendly Polysilanes. An Alternative Route to Polysilane Photoresists.", ACS Spring Meeting 1995, PMSE, vol. 72, Apr. 1995, pp. 205-206.

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