1987-08-27
1990-11-06
Hille, Rolf
357 234, 357 13, 357 12, H01L 2910, H01L 2990, H01L 2988
Patent
active
049690191
ABSTRACT:
A semiconductor device for generating tunnel electron carries without a depleted PN junction. A heavily doped P-type semiconductor region (12) is formed in a lightly doped P-type semiconductor substrate (10), and spaced apart from a heavily doped N-type semiconductor region (18), forming a conduction channel (20) therebetween. A thin electrical insulator (14) is formed overlying the P-type region (12) and the conduction channel (20). A gate conductor (16) is formed overlying the thin insulating layer (14). Connections to the semiconductor device are provided by a substrate terminal (22) connected to the substrate (10), a gate terminal (24) connected to the gate conductor (16), and a drain terminal (26) connected to N-type semiconductor region (18). A voltage applied to the gate terminal (24) is effective to cause band bending in the P-type region (12) in excess of the band gap, thereby causing tunneling of electrons from the valence band to the conduction band. Inversion of the P-type region (12) is prevented by a drain voltage applied to the N-type region (18) which attracts conduction electrons.
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"A New Three-Terminal Tunnel Device", IEEE Electron Device Letters, vol. EDL-8, No. 8, Aug. 1987 by Sanjay Banerjee et al.
"A Band-to-Band Tunneling Effect in The Trench Transistor Cell: Part I"; by Banerjee et al.; Symposium on VLSI Technology, 1987, Japan.
Comfort James T.
Fahmy Wael
Hille Rolf
Kesterson James C.
Sharp Melvin
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