Method of fabricating a self-aligned contact using organic diele

Details Method of fabricating a self-aligned contact using organic diele Method of fabricating a self-aligned contact using organic diele

1994-08-23

1996-01-09

Nguyen, Tuan H.

Fishing, trapping, and vermin destroying

437228, 437236, 437203, 1566441, 1566511, H01L 2144

Patent

active

054828945

ABSTRACT:
A semiconductor device and process for making the same are disclosed which incorporate organic dielectric materials to form self-aligned contacts (SACTs) reliably, even in deep, narrow gaps. In one embodiment, conductors 26 with insulating conductor caps 28 are formed over a silicon substrate 20 with a thin gate oxide 22. A conformal dielectric layer 30, preferably of thermally-grown oxide, is deposited over this structure, which is then covered with an organic-containing layer 32 and an inorganic cap layer 34 (e.g., CVD TEOS). An etch window 38 is patterned in photoresist layer 36 and used as a mask to etch cap window 39 through layer 34, using layer 32 as an etch stop. A second etch removes organic-containing layer 32 in contact window 41 (and preferably strips photoresist), using conformal layer 30 as an etch stop. A short anisotropic etch may be used to clear conformal layer 30 from gap bottom 43, after which conducting material 40 may be used to make electrical contact to the substrate.

REFERENCES:
patent: 4576900 (1986-03-01), Chiang
patent: 4683024 (1987-07-01), Miller et al.
patent: 4980316 (1990-12-01), Huebner
patent: 5037777 (1991-08-01), Mele et al.
patent: 5069747 (1991-12-01), Cathey et al.
patent: 5100838 (1992-03-01), Dennison
patent: 5198298 (1993-03-01), Haskell et al.
patent: 5200358 (1993-04-01), Bollinger et al.
patent: 5246883 (1993-09-01), Lin et al.
patent: 5279989 (1994-01-01), Kim
patent: 5371047 (1994-12-01), Greco et al.
patent: 5393712 (1995-02-01), Rostoker et al.
Ser. No. 08/234,100, Apr. 27, 1994, Havemann.
Ser. No. 08/234,099, Apr. 27, 1994, Havemann

Affiliated with

Also associated with

Rating

Method of fabricating a self-aligned contact using organic diele does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a self-aligned contact using organic diele, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a self-aligned contact using organic diele will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1302915